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  • Full automatic sapphire wafer cleaning machine

Product Description

 Product functions:           

1. it is suitable for cleaning 2 inch, 4inch and 6inch sapphire substrate wafers.           

2. the advanced etching process is used to ensure the stability of the process tank during operation.           

3. set up automatic drying system.           

4. Full automatic control, geometric curve acceleration and deceleration movement, small impact, smooth movement, high positioning accuracy of the manipulator.           

5. The key core components of pipeline system, electrical control system, servo motor and screw guide are all imported standard products, which are modularized and easy to maintain.